Technical Notes:

1. ALD/CVD precursor for Hf thin film deposition.

References:

1.Chem. Mater. 2002, 14, 4350.

2.Chem. Vap. Deposition 2002. 8 1 99.

3.J. Electrochem. Soc. 2005, 152, G213.

4.Chem. Mater.2004, 16, 3497 .