Technical Notes:

1.ALD/CVD precursor mainly used for TiN 1 ,review and TiO2 based thin film de positions .

References:

1.J.Appl Phys. 2013 113. 021301.

2.Microelectron Eng 2009 86 72

3.J Vac. Sci Tech A 2018 36 06A105

4.Appl Surf Sci 2018 462. 1029

5.J App. Phys. 2007. 102. 083521

6.J Electrochem. Soc. 2008 155. H688.