Technical Notes:

1.AL .D precursor used for Mo thin film deposition

References:

1.Chem. Vap. Deposition 2001 Z 33.

2.ACs App/. Mater. Interfaces 2019 11 173211

3.Chem. Mater. 2019. 31. 8338.

4.J. Mater. C hem.. 2011 21 705.

5.J. Electron. Mater.. 2018. 4Z. 6709.

6.Nanoscale.2014. 6. 14453.

7.L angmuir2015. 31.1196

8.App/. Surf. Sci.. 2016 365. 1 60.

9.Phys. Status Solidi RRL 2018 12 1 800023.

10. J. Vac. Sci. Technol. A. 2020. 38. 022409.