Technical Note:

1.AL D/CVD precursor for the preparation of Cu, Cu2O, or Cu2S films for electronic applications at temperatures ranging from 135 to 170'C. The Tsubl = 90'C/0.05 Torr and has a decomposition te mperature of 1 85-188C.

References:

1.Chem. Mater., 2011, 23, 441 1

2.Chem. Mater., 2014, 26, 3731

3.J. Phys. Chem. c 2015, 119, 9375

4.Dalton Trans., 2015, 44, 10188

5.Chem. Mater. 2016, 28, 6282

6.Dalton Trans., 2017, 46, 5790

7.Chem. Mater. 2017, 29, 6502