Technical Notes:

1.Plasma-Assisted ALD for the Conformal Deposition of SiO2

Room-Temperature ALD of Metal Oxide Thin Films by Energy- Enhanced AL D

2.Atomic L ayer Deposition of Silica on Carbon Nanotubes

3.Area-Selective Atomic L ayer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle

References:

1.J. Electrochem. Soc., 2012, 159, H277.

2.Chem. Vap. Deposition, 2013, 19, 125.

3.Chem. Mater., 2017, 29, 4920.

4.ACS Nano, 2017, 11, 9303.