Technical Notes：

1.Precursor for the preparation of boron oxide films deposited by MOCVD method

2.CVD precursor for the preparation of boron doped single- and multiwalled carbon nanotubes

3.CVD precursor for the preparation of boron doped titanium dioxide for photocatalytic water reduction and oxidation

4.Precursor for the preparation of B-doped ZnO transparent conductive oxides films deposited by AL D

References:

1.Thin Solid Films 2004, 464-465, 164

2.J. Mater. Chem.. 2008, 18, 5676

3.Phys. Status Solidi B, 2009, 246, 2518

4.Phys. Chem. Chem. Phys., 2013. 15, 16788

5.J. Mater. Chem. A, 2017, 5, 10836

6.J. Mater. Chem. c, 2015, 3, 3095

7. Sol. Energy Mater. Sol. Cells 2017 asap publication to be updated